In situ studies of dynamic processes

Description

The aim to study diffusion or drift of elements causing phase separation and affecting compositional gradients.

Surface structures may differ from those observed ex-situ or in UHV. Dynamic effects may play a significant, if not decisive, role.

Dynamic processes require in situ studies under relevant conditions: ambient pressure, illumination and voltage bias. In situ AP-XPS/HAXPES, XAS measurements: give insights into surface/interface chemical reactions, phase segregation, diffusion phenomena, and may help distinguish between reversible vs non-reversible changes that may occur. Also relevant for in situ thin film growth by atomic layer deposition (ALD).